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High efficiency of AE low frequency power supply

Source: Time:2017-08-08 10:06:54 views:

        AE low-frequency power supply provides an efficient, easy-to-integrate feature to improve process control for a variety of applications.

(1) PDX® IF power supply

AE中低频电源
        The AE PDX® series of low power (1250 and 1400 W) and high power (5000 and 8000 W) AE IF power supplies provide an efficient, compact, and easy-to-integrate power supply for a wide range of process applications. These highly reliable power supplies increase process flexibility, provide a wide range of operating frequencies to optimize process control, ensure high process repeatability, and increase throughput.

(2) PEII low frequency series
AE中低频电源
        The AE PEII low-frequency series power supply provides 40 kHz pulse output with enhanced arc control and up to 60 kW output power. The series power supply has extremely wide matching impedance, no output transformer and other external combination hardware, especially for reactive sputtering.

(3) LFGS RF generator

        The AE LFGS generator is a versatile RF generator for semiconductor production and general plasma processing. This type of variable frequency generator uses a half-bridge, D-type amplifier concept, has an air-cooled compact design, can be installed in the 19-inch rack above. Typical applications include sputtering, plasma etching, chemical meteorology deposition, polymerization, and surface treatment.

AE LFGS RF generator advantages:
* Can achieve the lowest available power on the market today

AE LFGS RF generator function:
* Air-cooled design
* Multi-function front panel
* Pulse mode: 0 to 10kHz
* Better operation of the function table
* 2 analog user ports
* RS-232 interface, Ethernet interface and PROFIBUS interface

(4) Crystal® low sine wave power supply

AE中低频电源
        Advanced Energy (AE) Crystal® power supply is ideal for large area glass coating applications such as architectural glass, automotive glass, antireflective coating and high reflector. Lower failure rate, return your higher yield. The available power of these power sources is 180kW, 120KW, 60KW. For the dual target magnetron sputtering applications to provide a wider range of anti-matching low-frequency sinusoidal power supply. AE's Crystal power supply is the only AC high-power AE power supply designed specifically for the plasma environment.

Advantages of AE Crystal® Low Sine Wave Power:
* More flexible
* Production is higher
* Reduce downtime
* Increased throughput

AE Crystal® low sine wave power supply features:
* Wide impedance matching low frequency sinusoidal process power supply
* High power supply - up to 180kW power
Designed specifically for the plasma environment

(5) Ascent® DMS Advanced Twin Magnetron Cathode Sputtering System: 30 - 180 kW

AE中低频电源
        The AE Ascent® DMS Series provides unprecedented power output convenience and control for dual magnetron target sputtering applications to precisely control film properties. With optional frequency, adjustment mode, duty cycle and low arc energy storage and simple modular system configuration, the Ascent DMS power supply system is unique, a new generation of dual magnetron target sputtering power supply program. Relying on cost-effective, scalability and versatility and other characteristics, to minimize the complexity of the equipment to improve the coating quality and capacity, in order to achieve high-end process innovation.

Benefits of using the AE Ascent® DMS series:
* Increases the film value: Achieves repeatable, innovative, custom coated
* Reduce the use of cost, improve coating capacity
* Reduce early investment in equipment
* Higher power output, less arc damage
* Easy expansion, integration and technical support

Features of the AE Ascent® DMS Series:
* Modular, expandable (30, 40 and 60 kW models can be combined into a maximum of 180 kW power output)
* Frequency selectable (500 Hz - 50 kHz)
* Power, current and voltage mode control
* Duty duty adjustable - can control the input to each magnetron target power
* Unipolar and bipolar operation
* Lower the arc energy than any other dual magnetron target sputtering power supply
* With CEX function (phase synchronization)
* Complies with EU RoHS


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