Advantage	Features
• Wide range of functions  • Flexible DC pulse accessories series  • Increase throughput by allowing higher power to run  • Reduce target contamination  Increase the power of 10-200kW  •Provide a fixed and variable   • frequency of 2-100kHz	• Excellent arc control - in many cases, the arc is completely eliminated.  • Ion energy is higher  • More power to run  • Lower substrate temperature  • The target temperature is lower  • Process flexibility and tolerance  • System integration is easy  • Double cathode function (Astral® product)

二、 ASCENT® AP (Advanced Pulse) power supply
Unique single / bipolar pulse magnetron sputtering power supply

In 2013, AE® brought new technological innovations to bipolar magnetron sputtering by using bipolar pulse DC technology, providing unprecedented plasma control technology. The Ascent AP power supply introduces additional control parameters in a compact single / bipolar magnetron sputtering scheme, making the power output more optimized. Ascent AP's patented pulse technology, which can proactively suppress arcs, has a wide range of work that allows the power supply to be used in many materials, extending the flexibility of the process and the constant innovation of materials.

Advantage	Features
• Precise sputtering of dielectric and conductive films  •Provide single magnetron and dual magnetically controlled configurations  •Increased flexibility and innovation in process control  • High performance film quality and yield  • Coating repeatability is good, and meet a number of custom requirements  •Higher power rating, less arc damage  •Easy integration and control	•Output waveform can be customized to meet a variety of power output requirements  •Patented pulse technology can inhibit the elimination of arc, to ensure higher power output, improve production capacity  •Compact stand-alone solution (up to 30 kW) Setpoint compensation ™ technology ensures stable power output  •Wide range of work for a wide range of process materials

三、 Ascent® DC power supply with Arc Management System ™ technology

Advantage	Features
•Ensure that the site reliability to achieve the highest  •Efficient arc management to improve film quality, productivity, yield and profitability  •Simplify power supply integration for the following applications   * Solar energy   * FPD   * Industrial coating   * Coated coating	•30, 40 and 60 kW models  •Patented and patent pending  •Arc Management System ™ technology  •Set Point Compensation ™ technology  •Virtual front panel software  • Remote control of the front panel and passive front panel  •RS-232/485, Ethernet, Profibus and analog communication interface  •Master / slave stack to up to 12 units  •All-weather technical support  •RoHS compliant

四、Pinnacle® series

The industry's proven Pinnacle® DC power platform offers excellent process consistency and control capabilities, resulting in significant process variations and increased throughput. This compact, powerful kit provides the industry's lowest storage energy, the fastest arc response and the widest range of full-power operating impedance ranges.

Advantage	Features
•30, 40 and 60 kW models  •Patented and patent pending  •Arc Management System ™ technology  •Set Point Compensation ™ technology  •Virtual front panel software  •Remote control of the front panel and passive front panel  •RS-232/485, Ethernet, Profibus and analog communication interface  •Master / slave stack to up to 12 units  •All-weather technical support  •RoHS compliant	•Minimum storage energy - less than 1mJ per kilowatt output  •No need to adjust the output transformer  •4: 1 impedance range  •Target processing time - minimizes the processing time of the new target  •± 0.1% output repeatability  •Joule mode - the optimal energy transfer

五、 Pinnacle® Plus +

Advanced Energy (AE) Pinnacle® Plus + power supply for single DC pulse power supplies offers all the advantages of a pulsed DC solution for your reaction process, including ease of use, cost savings and excellent flexibility. Combined with standard direct current technology and proven pulsed DC technology, Pinnacle Plus + power is superior to complex and expensive AC solutions for higher deposition rates, better repeatability, and better film quality.

Advantage	Features
•Higher deposition rate and product rate  •Film uniformity and quality first class The damage to the substrate caused by the arc is reduced  •Lower cost  •System integration is easy  •Excellent process flexibility and tolerance  •Repeat performance  •Stable on excessive curves  •Higher throughput  •Easy to monitor  •Unparalleled system flexibility	•A compact package  •The frequency adjustment range is 5-350kHz  •Duty ratio up to 45%  •Wide voltage range - single output  wide impedance range  •High power operation  •Low substrate temperature  •Single output (5kW and 10kW models)  •Dual output for dual-cathode production (dual 5kW model)  •Excellent arc control  •Reactive sputtering closed loop control

六、Pinnacle® 3000

Advantage	Features
•Proven Pinnacle performance and reliability  •Maximum process efficiency - lowest operating and installation costs  •Versatility - Excellent performance in sputtering and bias applications  •Fast, configurable arc response - less arc damage  •Accurate process control  •Multiple display / control options  •Complies with safety / radiation standards	•The industry's highest efficiency and power factor  •Compact - in a 2-U, 1/2 bracket package, the power of 3000W  •Single output taps, extensive range of fatigue  •Profibus and RS-232 serial communication  •Target processing time - minimizes the processing time of the new target  •Only 400 VAC input  •Low storage energy - less than 6 mJ per kilowatt output  •Output reproducibility of ± 0.1% at greater than 15%  •Joule mode - the optimal energy transfer  •Programmable limits on output level, breakdown voltage, and process voltage  •Save settings for automatic saving  •CE mark

七、Pinnacle® Diamond™

 In process and bias applications, Pinnacle® Diamond ™ DC power supplies provide the highest efficiency and power factor, resulting in the industry's lowest operating and installation costs. Pinnacle's excellent process consistency and control brings the added benefit that greatly reduces the yield through an extremely compact component.

Advantage	Features
•Proven Pinnacle performance and reliability  •Maximum process efficiency - lowest operating and installation costs  •Versatility - Excellent performance in sputtering and bias applications  •Fast, configurable arc response - less arc damage  •Accurate process control  •Multiple display / control options  •Complies with safety / radiation standards	•The industry's highest efficiency and power factor  •Compact - in a 2-U, 1/2 bracket package, the power of 3000W  •Single output taps, extensive range of fatigue  •Profibus and RS-232 serial communication  •Target processing time - minimizes the processing time of the new target  •Only 400 VAC input  •Low storage energy - less than 6 mJ per kilowatt output  • Output reproducibility of ± 0.1% at greater than 15%  •Joule mode - the optimal energy transfer  • Programmable limits on output level, breakdown voltage, and process voltage  •Save settings for automatic saving  •CE mark

The MDX 500 is durable in a vacuum environment and is capable of multi-stage suppression and arcing of different types of arcs in a magnetron environment. In the basic magnetron sputtering, RF bias DC sputtering and DC bias RF sputtering performance in the first class. Its compact size makes it ideal for laboratory systems and small-scale production environments.

Advantage	Features
•Overload built-in protection   •Reliability and durability   •Rapid response time   •Compatibility certification	•Multi-stage arc suppression and arc  suppression   •User I / O access   •Power, current or voltage regulation

九、MDX series 1 kW and 1.5 kW

Precise adjustment function, excellent arc suppression and low storage output energy make MDX series DC power supply a leading product in the industry. Due to the durability in a vacuum environment, these power sources adapted to harsh environments are often used as DC magnetron sputtering drives and are widely used. The product line also offers precision regulation properties such as bias power and etching systems in RF sputtering. The tight design makes it the preferred solution for the lab system.

Advantage	Features
•Precise adjustment function Increase yield  • Reduce target burn time  •High reliability  •Simple maintenance and replacement	•Lower storage output energy  • Output ripple is low  •Adjustable arc suppression time  •high efficiency  •Close design  •Voltage, current and power regulation modes  •Panel and analog interface control  •Various protection functions